three target magnetron sputtering coating machine with UPS for R&D
| Min. Order: | 1 Set/Sets |
|---|---|
| Trade Term: | FOB |
| Payment Terms: | Paypal, T/T, WU, Money Gram |
| Supply Ability: | 50 sets/month |
| Place of Origin: | Henan |
Company Profile
| Location: | Zhengzhou, Henan, China (Mainland) |
|---|---|
| Business Type: | Manufacturer, Trading Company |
Product Detail
| Model No.: | CY-MSP325S-3RF-D |
|---|---|
| Means of Transport: | Air |
| Application: | thin film R&D |
| Chamber size: | φ300mm×300mm |
| Chamber material: | Stainless steel |
| Observation window: | φ100mm |
| Target diameter: | 2-inch*2 (1-inch,2-inch optional) |
| Sample stage: | φ185mm |
| Rotate speed: | 0-20 rpm adjustable |
| Ultimate vacuum: | 1.0E-5Pa |
| Pumping rate: | Molecular pump: 600L/S rotary vane pump: 1.1L/S |
| Sputter power supply: | three 300W RF power supply |
| Production Capacity: | 50 sets/month |
| Packing: | tandard export fumigation sign wooden box packaging |
| Delivery Date: | 30 days |
Product Description
three target magnetron sputtering coater with UPS
CY-MSP325S-3RF-D
Intro
Three targets RF magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable.
Characteristic
There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.
The device is equipped with three 300W RF power supply. The RF power supply can be used for the preparation of non-metal. The three targets can meet the needs of multi-layer or multiple coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.
The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements.
The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency.
This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Application:
The device can be used for preparing single or multi-layer ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the threel-target magnetron sputtering coating machine is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing a material film in a laboratory.
Technical parameter
Supply Voltage | VAC 220, 60Hz |
UPS | l 20KVA 16KW, 1 hour delay 16 batteries, with capacity of 38AH |
Vacuum Chamber | l imension: Dia. 325 mm * H 385 mm l Material: 304 stainless steel Viewport (Window): ~4'' (100mm) with shutter |
Sample Stage | Top sample holder Sample table: Dia. 150mm Sample size: Max. 4'' diameter Rotary speed: 0-40rpm adjustable Heating temperature: up to 700oC |
Water Chiller | Water flow rate: 2.3m3/h Power: 3P Cooling Capacity: 8250Kcal/h Compressor output power: 2.25KW |
3× 2'' magnetron sputter guns, with automatic shutter Sputtering orientation upwards Target diameter: 2'' Magnets: rare earth magnet | |
RF Generator | 3 × RF 300W power supply with auto match Power output range: 5W~300W Maximum reflected power: 100W Power stability: ±0.1% Harmonic component: ≤-50dbc Power supply: Single phase 187-253 VAC, 50/60HZ Efficiency: ≥70% Power factor: ≥90% Reflected power (at maximum power):<3W Maximum load current: 30ARMS Maximum load voltage: 7500VRMS RF output connector: 50 Ω, L29 or customized Match time: 1~3s Real part range of matched impedance: 0~80Ω Imaginary part range of matched impedance:﹣200j~ ﹢200j Cooling method: forced cooling |
Mass Flow Meter | 3 × MFC mass flow control (Ar, O2 and N2) Measuring ranges: up to 20sccm With pneumatic isolation valve(s) and filter |
Full Automatic control by PC or PLC, to control | Store for minimum 100 recipe 19'' Flat controller |
Detail pictures
