dual target DC RF magnetron bias sputtering coating machine for lab
| Min. Order: | 1 Set/Sets |
|---|---|
| Trade Term: | FOB |
| Payment Terms: | Paypal, T/T, WU, Money Gram |
| Supply Ability: | 50 sets/month |
| Place of Origin: | Henan |
Company Profile
| Location: | Zhengzhou, Henan, China (Mainland) |
|---|---|
| Business Type: | Manufacturer, Trading Company |
Product Detail
| Model No.: | CY-MSP300S-RFDC-BS |
|---|---|
| Means of Transport: | Air |
| Application: | thin film R&D |
| Chamber size: | φ300mm×300mm |
| Chamber material: | Stainless steel |
| Observation window: | φ100mm |
| Target diameter: | 2-inch*2 (1-inch,2-inch optional) |
| Sample stage: | φ140mm |
| Rotate speed: | 0-20 rpm adjustable |
| Ultimate vacuum: | 1.0E-5Pa |
| Pumping rate: | Molecular pump: 600L/S rotary vane pump: 1.1L/S |
| DC /RF power supply: | 1000W 500W |
| Production Capacity: | 50 sets/month |
| Packing: | tandard export fumigation sign wooden box packaging |
| Delivery Date: | 30 days |
Product Description
DC RF magnetron bias sputtering coater
INTRO
Double target magnetron sputtering coater is a small laboratory coater with two targets developed by our company. It can be used to prepare single or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.
Features
Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high coating rate and low sample temperature rise, which is a typical high-speed low-temperature sputtering.
The magnetron target is equipped with a water-cooled inter layer, the water cooler can effectively take away heat, avoid heat gathering on the target surface, and make the magnetron coating work stably for a long time.
One DC power supply, 1000W, suitable for preparing metal film
One RF power supply, 500W, suitable for non-metallic coating
In addition, the device is also equipped with bias power supply, which can add bias electric field between the target and the sample platform, enhance the energy of ions, improve the film quality and adhesion of the film. The whole machine adopts touch screen control, one key coating procedure, simple operation, and is an ideal equipment for preparing thin film in the laboratory..
Technical Parameters
Voltage/ Power | AC220V,50Hz 3KW |
Sample carrier | Size:φ140mm Heating temperature:MAX.500℃ Accuracy:±1℃ Speed:1~20rpm adjustable |
Magnetron sputtering head | Number: two ,2-inch Cooling mode:Water cooling,10L / min flow rate |
| Vacuum Chamber | Size:φ300mm × 300mm H Material:stainless steel Observation window:φ100mm Opening mode:Open top, easy to replace the target |
Gas flow controller | 2 ways: Ar, N2;Range 0-100sccm |
Vacuum pump | Molecular pump system, pumping speed: 600L/S Ultimate vacuum 10-6 torr |
Film thickness gauge | Quartz vibrating film thickness gauge , resolution: 0.10 μ M |
Sputtering power supply | One DC power supply, 1000W, suitable for preparing metal film One RF power supply, 500W, suitable for non-metallic coating |
Operation mode | Panel button operation |
Dimensions / Weight | 1400mm × 750mm × 1300mm 300 KG |
Detail pictures
