compact double target RF DC magnetron sputtering co-sputtering coating machine

CY-MSP210S-RFDC desktop dual-target magnetron sputtering coating instrument.

Intro

• The equipment has been miniaturized, while retaining the high-vacuum stainless steel cavity, while simplifying other mechanisms, limiting the shape of the equipment to the desktop level, greatly reducing the installation site requirements. 

• The equipment is equipped with a DC power supply and an RF power supply. The DC target can be used for sputtering of metals and other conductive materials. The RF power supply can be used for sputtering of various non-metals and metal oxides. 

• The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements

• The equipment vacuum system adopts all imported vacuum pumps, with fast pumping speed, high ultimate vacuum and excellent vacuum performance. 

• The equipment has compact structure, perfect functions and easy to use. It is very suitable for various coating tests

Application

• This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. 

• Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory

Technical parameter