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RF magnetron sputtering deposition coating machine for insulation

21000.0 USD
Min. Order: 1 Set/Sets
Trade Term: FOB
Payment Terms: Paypal, T/T, WU, Money Gram
Supply Ability: 50 sets/month
Place of Origin: Henan

Company Profile

Location: Zhengzhou, Henan, China (Mainland)
Business Type: Manufacturer, Trading Company

Product Detail

Model No.: CY-MSP300S-RF
Means of Transport: Air
Application: thin film R&D
Chamber size: φ300mm×300mm
Chamber material: Stainless steel
Observation window: φ100mm
Target diameter: 2 inches
Sample table: φ185mm
Rotate speed:: 1-20rpm adjustable
Ultimate vacuum: 1.0E-5Pa
Pumping rate: Molecular pump: 600L/S rotary vane pump: 1.1L/S
RF power supply: 300W
Production Capacity: 50 sets/month
Packing: tandard export fumigation sign wooden box packaging
Delivery Date: 30 days
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Product Description

RF magnetron sputtering deposition coating machine for insulation 

CY-MSP300S-RF

Intro

  • The magnetron target head has 1 inch 2 inches and 3 inches to choose from. Customers can choose the target according to the size of the substrate to be plated. The device is equipped with 300W RF power supply, which can be used for sputtering of non-metal film and optical film. According to the experimental requirements, other specifications of DC or RF power supply can be selected to realize the coating operation of various materials.

  • The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. 

  • The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency.

  •  This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency

Application

The device can be used to prepare single-layer ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the single-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for research on solid electrolyte and OLED in the laboratory.


Technicalparameter

Sample stage

Size:φ185mm

Temperature control accuracy:±1℃

Heating temperature:Max 500℃

Rotate speed:1-20rpm adjustable

Magnetron Sputtering target head

2"×1 (1",2",3"optional)

Circulating water chiller with flow rate of 10L/min

Vacuum chamber

Chamber size:φ300mm×300mm

Watch window:φ100mm

Chamber material:Stainless steel

Opening mode:Top cover removable

Mass flow meter

2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs)

Vacuum system

Model:CY-GZK103-A

Pumping interface:KF40

Molecular pump:CY-600

Exhaust interface:KF16

Backing pump:rotary vane pump

Vacuum measurement:Compound vacuum gauge

Ultimate vacuum:1.0E-5Pa

Power supply:AC;220V 50/60Hz

Pumping rate:Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes

Power configuration

RF power supply ×1;Max output power:300W

Other parameters

Supply voltage:AC220V,50Hz

Overall size:600mm×650mm×1280mm

Total power:2KW

Total Weight:300kg

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