laboratory DC magnetron sputtering coating machine with reciprocating sample table
| Min. Order: | 1 Set/Sets |
|---|---|
| Trade Term: | FOB |
| Payment Terms: | Paypal, T/T, WU, Money Gram |
| Supply Ability: | 100 sets/month |
| Place of Origin: | Henan |
Company Profile
| Location: | Zhengzhou, Henan, China (Mainland) |
|---|---|
| Business Type: | Manufacturer, Trading Company |
Product Detail
| Model No.: | CY-MSP180G-RS |
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| Means of Transport: | Air |
| Application: | thin film R&D |
| Chamber size: | φ180mm x 215mm |
| Chamber material: | High purity quartz |
| Observation window: | Omnidirectional transparency |
| Target thickness: | Recommended 2~5mm |
| Target diameter: | 2 inches |
| Reciprocating sample table: | 50*100 mm |
| Reciprocating speed: | 0~50mm/s |
| Ultimate vacuum: | 1.0E-4Pa |
| Pumping rate: | Mechanical pump 1.1L/s Molecular pump 600L/s |
| Production Capacity: | 100 sets/month |
| Packing: | tandard export fumigation sign wooden box packaging |
| Delivery Date: | 30 days |
Product Description
Desktop single target magnetron sputtering coater with reciprocating sample table
Intro
high cost performance magnetron sputtering coating equipment independently developed by our company, which has the characteristics of miniaturization and standardization.
The magnetron target can be selected from 1 inch and 2 inches, and customers can choose according to the size of the substrate to be plated;
the power supply is 150W DC power supply, which can be used for metal sputtering coating.
The coating instrument is equipped with a vent interface, which can be filled with protective gas. If the customer needs to mix gas, you can contact the staff to configure a high-precision mass flow meter to meet the needs of the experiment.
The instrument is equipped with advanced turbo molecular pump set, the ultimate vacuum can reach 1.0E-5Pa, and other types of molecular pumps are also available for purchase.
Application scope:
DC magnetron sputtering can be used to prepare single-layer ferroelectric films, conductive films, alloy films, etc. Compared with similar equipment, this single-target magnetron sputtering coating instrument is compact in design, highly integrated, compact, and can be placed on a table for use. It is an ideal equipment for preparing material films in the laboratory.
Technical parameters:
Reciprocating sample table | size 50*100mm Reciprocating speed 0~50mm/s |
Magnetron target gun | Target plane Circular flat target Sputtering vacuum 10Pa～0.2Pa Target diameter 2 inches Target thickness Recommended 2 ～ 5mm Target temperature ≦65℃ |
Vacuum chamber | Cavity size About Φ180mm × H 215mm Cavity material High purity quartz Observation window Omnidirectional transparency Opening method Removable top cover |
Power supply | DC power supply 150W max |
Molecular pump system | Foreline pump Rotary vane pump VRD-4 Pumping speed 1.1L/S Ultimate vacuum 5*10-1Pa Molecular pump Molecular pumping speed 600L/S Rated speed 24000rpm Ultimate vacuum 5*10-5Pa Vibration value ≦0.1um Start Time ≦4.5min Downtime <7min cooling method Water cooling + air cooling |
Water cooler | Cooling water temperature ≦37℃ Cooling water flow rate 10L/min |
Supply voltage | AC220V 50Hz |
Detail picture
