desktop single head magnetron sputtering coating machine for depositing aluminum
| Min. Order: | 1 Set/Sets |
|---|---|
| Payment Terms: | Paypal, T/T, WU, Money Gram |
| Supply Ability: | 100 sets/month |
| Place of Origin: | Henan |
Company Profile
| Location: | Zhengzhou, Henan, China (Mainland) |
|---|---|
| Business Type: | Manufacturer, Trading Company |
Product Detail
| Model No.: | CY-MSP180G-ALDC |
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| Means of Transport: | Air |
| Application: | thin film R&D |
| Overall size: | 550mm x 350mm x 500mm |
| Total power: | 2kW |
| Chamber size: | φ180mm x 215mm |
| Sample stage size: | φ100mm |
| Magnetron sputtering head: | 2" x1 |
| Rotating speed: | 0-20rpm adjustable |
| Heating: | Max. 500℃ |
| Ultimate vacuum: | 1.0E-4Pa |
| Pumping rate: | Mechanical pump 1.1L/s Molecular pump 600L/s |
| Production Capacity: | 100 sets/month |
| Packing: | tandard export fumigation sign wooden box packaging |
| Delivery Date: | 30 days |
Product Description
CY-MSP180G-ALDC Desktop single sputter head magnetron sputtering coater (for depositing aluminum)
Intro
This equipment is a desktop single sputter head magnetron sputtering coating machine. The miniaturized design of the equipment limits the appearance of the equipment to the desktop level, greatly reducing the installation site requirements. This equipment has compact structure and perfect function and is easy to use, and is very suitable for various coating tests.
It has the characteristics of miniaturization and standardization. The magnetron target head has 1 inch and 2 inches to choose from. Customers can choose the target according to the size of the substrate to be plated.
The device is equipped with 150W DC power supply, which can be used for metal sputter coating.
The coating machine is equipped with gas inlet port for the introduction of protective gas. If the customer needs the mixed gas, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs.
The instrument is equipped with advanced turbomolecular pump set, the ultimate vacuum is up to 1.0E-5pa, and other types of molecular pumps are also available.
Application
The equipment is equipped with a high-performance DC power supply with target refining function, which can effectively remove the oxide layer on the surface of the aluminum target. It is very suitable for aluminum plating and other materials that are very sensitive to air.
Technical parameters:
Sample stage | Size φ100mm Rotating speed 0-20rpm adjustable Heating Max. 500℃ |
Magnetron sputtering head | Quantity 2" x1 |
Vacuum chamber | Chamber size φ180mm x 215mm Observation window Omnidirectional transparent Chamber material High purity quartz Open method Upper cover removable |
Vacuum system | Mechanical pump Rotary vane pump Pumping port KF16 Exhaust interface KF16 Molecular pump Turbomolecular pump Pumping port KF40 Exhaust interface KF40 Vacuum measurement Resistance gauge + ionization gauge Ultimate vacuum 1.0E-4Pa Power supply AC 220V 50/60Hz Pumping rate Mechanical pump 1.1L/s Molecular pump 600L/s |
Power configuration | Quantity DC power supply x1 Max. output power DC power supply 500W Supply voltage AC220V, 50Hz |
Others | Total power 2kW Overall size 550mm x 350mm x 500mm |
Detail pictures
