lab-scale desktop DC magnetron sputtering coating machine
| Min. Order: | 1 Set/Sets |
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| Payment Terms: | Paypal, T/T, WU, Money Gram |
| Supply Ability: | 100 sets/month |
| Place of Origin: | Henan |
Company Profile
| Location: | Zhengzhou, Henan, China (Mainland) |
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| Business Type: | Manufacturer, Trading Company |
Product Detail
| Model No.: | CY-MSP180G-DC |
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| Means of Transport: | Air |
| Application: | thin film R&D |
| Overall size: | 550mm x 350mm x 400mm |
| Total power: | 2kW |
| Chamber size: | φ180mm x 215mm |
| Sample stage size: | φ100mm |
| Magnetron sputtering head: | 2" x1 |
| Rotating speed: | 0-20rpm adjustable |
| Heating: | Max. 500℃ |
| Ultimate vacuum: | 1.0E-4Pa |
| Pumping rate: | Mechanical pump 1.1L/s Molecular pump 600L/s |
| Production Capacity: | 100 sets/month |
| Packing: | tandard export fumigation sign wooden box packaging |
| Delivery Date: | 30 days |
Product Description
CY-MSP180G-DC Desktop single sputter head magnetron sputtering coater
Intro
Small desktop single-target DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization.
The magnetron target head has 1 inch and 2 inches to choose from. Customers can choose the target according to the size of the substrate to be plated.
The device is equipped with 150W DC power supply, which can be used for metal sputter coating.
The coating machine is equipped with gas inlet port for the introduction of protective gas. If the customer needs the mixed gas, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs.
The instrument is equipped with advanced turbomolecular pump set, the ultimate vacuum is up to 1.0E-5pa, and other types of molecular pumps are also available.
Application:
The device can be used to prepare single-layer ferroelectric thin films, conductive films, alloy films, and so on. Compared with similar equipment, the single-target magnetron sputtering coater is compact, highly integrated and small in size, and can be placed on a desktop. It is an ideal equipment for laboratory preparation of material films.
Technical parameter
Sample stage | Size φ100mm Heating Max. 500℃ Rotating speed 0-20rpm adjustable |
Magnetron sputtering head | Quantity 2" x1 |
Vacuum chamber | Chamber size φ180mm x 215mm Observation window Omnidirectional transparent Chamber material High purity quartz Open method Upper cover removable |
Vacuum system | Mechanical pump Rotary vane pump Pumping port KF16 Exhaust interface KF16 Molecular pump Turbomolecular pump Pumping port KF40 Exhaust interface KF40 Vacuum measurement Resistance gauge + ionization gauge Ultimate vacuum 1.0E-4Pa Power supply AC 220V 50/60Hz Pumping rate Mechanical pump 1.1L/s Molecular pump 600L/s |
Power configuration | Quantity DC power supply x1 Max. output power DC power supply 150W |
Others | Supply voltage AC220V, 50Hz Total power 2kW Overall size 550mm x 350mm x 400mm |
Detail pictures
