High purity sputtering target ----- Copper Cu

Brand

MAT-CN

Origin

Nanchang Jiangxi

Specifications

Size 01: diameter <360mm  

              thickness> 1 mm

             (wafer / round table / rod)

Size 02: length <300mm

              width <300mm

              thickness> 1mm

              (rectangular / sheet / splicing)

Size 03: outer diameter <360mm

              inner diameter> 1mm

              length> 1 mm

              (pipe / ring / rotatable targets)

Size 04:be customized according to user needs, sample processing, to map processing

Minimum order quantity

1 piece, large concessions

Supply capacity

the same batch, the same material, continuous and reliable supply; 100 kg / month min              

Delivery time

2-3weeks after payment,excluding special material

Production process

vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining

Applicable instruments

various models magnetron sputtering equipment, etc.

Product uses

industrial-grade coating, experiments or research level Cu target Copper target, electronics, optoelectronics, military, decorative, functional film

Advantages

quality

1. reasonable price and good quality

2. high purity, less impurities

3.Dense, rolling, oxidation, forming plasticizers

4.relatively high density, grain uniformity axis, consistency

Product  accessories

formal quotation / purchase and sales contracts / packing list / material analysis detection of single / formal invoice

Packing vacuum

packaging / vacuum neutral packing / special packaging outside reinforcement packag                 

Mode of transport for

 UPS, DHL or FedEx or Ship(FOB/CIF)