High purity and high density sputtering target ---- ITO target

Physical properties 

Color

black

Density

7.14g/m³

Melting point

/

Technical indicators 

purity

99.99%

Relative density

>99.9%

Cut surface flatness

3.2Ra

Tolerance

0.1mm

grain size

uniform

Material 

ITO     In2O3 doped Sn2O3

Brand 

MAT-CN

Origin 

Nanchang Jiangxi China

Specifications 

Size 1: diameter <360mm

            thickness> 1 mm

            (wafer / round table / rod)

Size 2: length <300mm

            width <300mm

            thickness> 1mm

            (rectangular / sheet /splicing)

Size 3: outer diameter <360mm

            inner diameter> 1mm

            length> 1 mm

           (pipe / ring / rotatable targets)

Size 4:be customized according to user needs, sample processing, to map processing

Minimum order quantity 

1 piece,large concessions

Supply capacity 

the same batch, the same material, continuous and reliable supply; 100 kg / month min

Delivery time 

    3 weeks after payment,excluding special materials

Production process 

vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining

Applicable instruments 

various models magnetron sputtering equipment, etc.

Product uses 

industrial-grade coating, experiments or research level CuNiIn target electronics, optoelectronics, military, decorative, functional film

Advantages

quality 

1. reliability, price

2.restore preparation of high purity, less impurities

3.dense, rolling, oxidation, forming plasticizers

4.relatively high density, grain uniformity axis, consistency

Product accessories 

formal quotation / purchase and sales contracts / packing list / material analysis detection of single / formal invoice

Packing vacuum 

packaging / vacuum neutral packing / special packaging outside reinforcement package

Mode of transport for 

domestic express carrier DHL, FEDEX, EMS, UPS(FOB/CIF)---safe, fast and reliable