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Skin Rejuvenation IPL Laser Machine With Double E-Light Handle

Place of Origin: Zhejiang

Company Profile

Location: Guangzhou, Guangdong, China (Mainland)
Business Type: Manufacturer
Main Products: IPL Beauty Machine

Product Detail

Model No.: MINI-III

Product Description

 

Double E-Light handle and needn’t insert filter for skin rejuvenation and hair removal

 

a.Remove unwanted hair(All kinds of skin and color)

b Remove freckle, facial blemish;

c Skin rejuvenation, Shrink and tighten pores

d Acne therapy

e Remove facial vascular lesions. (Telangiectasis)

f Smooth skin,fine lines,restore flexbility

 

 

Skin Rejuvenation IPL Laser Machine With Double E-Light Handle

 

 

Description:

 

E-Light combines three advanced technologies: Bipolar Radio Frequency + IPL +Skin Contact Cooling.

When the three are united in one treatment, wonderful treatment experience and result can be expected. The energy of Radio Frequency can reach the middle and deep layer of the skin and heat up tissue, thus, lower energy is applied during the IPL treatment. Uncomfortable feeling during the IPL treatment will be decreased significantly and better result can be expected. In addition, cooling system involved in E-light can also ease the uncomfortable feeling.

 

 

Applications:

 

a.Remove unwanted hair(All kinds of skin and color)

b Remove freckle, facial blemish;

c Skin rejuvenation, Shrink and tighten pores

d Acne therapy

e Remove facial vascular lesions. (Telangiectasis)

f Smooth skin,fine lines,restore flexbility   

 

 

Specifications:

 

Mini- Technical Parameters

RF Energy

1.6MHZ

RF Duration Time

1000-8000ms

Two handles

E-light + Professional HR

Two Handles Spectrum range

530-1200nm  640-1200nm

Transmission System

Sapphire Coupling

Repeat frequency

1P/2S

Light Source

Intense Pulsed Light

Pulse Width:

1.0~9.9ms

Pulse intermission

10~99ms

Pulses

1-6T

IPL Energy Density:

2---50J/cm²

RF Energy Density:

10---50J/ cm²

Spot size

8×40 mm   

Cooling temperature

-5 - 0 degree

Cooling System:

Water cooling+forced-air cooling+Semiconductor cooling

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