Sputtering target TiAl WTi NiV Nb10Zr sputtering target

Sputtering target

Rhexon specializes in manufacturing a wide range of high quality sputtering targets ,which are extensively used in the industries of architectural & auto glass, optics, solar photovoltaic, flat panel display, decoration, electronics, semiconductor and etc.

The sputtering targets we are manufacturing show outstanding performance by virtue of high density, excellent purity, and distinguished homogeneous microstructure.

Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.

Featured targets from Rhexon:

Pure Metal:

Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu

Typical alloy:

1) Ti/Al (67:33,50:50at%)

2) W/Ti(90:10wt%),

3) Ni/V (93:7)

4) Ni/Cr(80:20, 70:30),

5) Al/Cr(70:30,50:50at%)

6) Nb/Zr(97:3,90:10wt%

7) Si/Al(90:10wt%)

8) Zn/Al