Niobium target, NIobium sputtring target
| Payment Terms: | T/T |
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| Place of Origin: | Hunan |
Company Profile
| Location: | Changsha, Hunan, China (Mainland) |
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| Business Type: | Manufacturer |
Product Detail
| Model No.: | RO4200,RO4100 |
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Product Description
Detailed Product Description
Niobium sputtering target Niobium alloy sputtering target
Material: R04200-1, R04210-2
Size:
circular targets: Diameter 25mm up to 400mm x Thickness 3mm up to 28mm
rectangular targets: Thickness 1mm up to 12.7mm x Width up to 600mm x Length up to 2000mm
Purity: >=99.9% or 99.95%
Table 1: technology parameter
99.9%min | |
Recrystallization | 95%min |
Grain size | ASTM 4 or finer |
Surface finish | 16Rms max. or Ra 0.4 ( RMS64 or better) |
Flatness | 0.1mm or 0.15% max |
Tolerance | +/-0.010" on all dimensions |
Table.1 Chemical composition:
Designation | Chief component | Impurities maxmium | |||||||||||
Nb | Fe | Si | Ni | W | Mo | Ti | Ta | O | C | H | N | ||
Nb1 | Remainder | 0.004 | 0.003 | 0.002 | 0.004 | 0.004 | 0.002 | 0.07 | 0.015 | 0.004 | 0.0015 | 0.002 | |
Nb2 | Remainder | 0.02 | 0.02 | 0.005 | 0.02 | 0.02 | 0.005 | 0.15 | 0.03 | 0.01 | 0.0015 | 0.01 | |