Tantalum target, Tantalum sputtering target
| Payment Terms: | T/T |
|---|---|
| Place of Origin: | Hunan |
Company Profile
| Location: | Changsha, Hunan, China (Mainland) |
|---|---|
| Business Type: | Manufacturer |
Product Description
Detailed Product Description
Tantalum sputtering targets (disk)\Tantalum- tungsten Alloy targets(disk)
Material: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)
Size:
circular targets: Diameter 25mm up to 400mm x Thickness 3mm up to 28mm
rectangular targets: Thickness 1mm up to 12.7mm x Width up to 600mm x Length up to 2000mm
Purity: >=99.95% or 99.99%
Table 1: technology parameter
3N, 3N5, 4N, with Ta 99.99%min | |
Recrystallization | 95%min |
Grain size | ASTM 4 or finer |
Surface finish | 16Rms max. or Ra 0.4 ( RMS64 or better) |
Flatness | 0.1mm or 0.15% max |
Tolerance | +/-0.010" on all dimensions |
Special requirements to be agreed on by the supplier and buyer of negotiation
The unlisted sizes are available upon customer's requirement.
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